Nanostructured block copolymer surfaces for nanotechnologies

Description

The ultimate objectives of this task are to push forward the methodologies inherent to the direct self-assembly of block copolymers (introduction of guiding patterns compatible with large area substrate with additional functionalities (i.e. control of the orientation of the block copolymer self-assembly or/and enhanced compatibility with plasma transfer methodologies) while designing new materials for the formulation of lithography resins addressing the ultra high-resolution (sub-22 nm node) as well as new pattern symmetries (i.e. block copolymer morphologies other than lamellar or cylindrical).